ZML Series Maskless Lithography System

Diverse Models
Efficient, Flexible, High Resolution, and High Overlay Accuracy

ZEPTOOTS ZML Series DMD Maskless Lithography System utilizes advanced digital micromirror direct writing technology, enabling flexible and precise exposure of arbitrary micro/nano patterns without the need for traditional photomasks, delivering excellent patterning accuracy and stable imaging. The system features a compact design, combined with intelligent autofocus and an intuitive operating system, making it easy to learn and efficient to use. It significantly shortens R&D cycles and reduces mask fabrication costs. Widely applicable in scenarios such as microfluidics, MEMS, functional films, and 2D material devices, it is an ideal micro/nano processing tool that balances high precision, high flexibility, and high cost-effectiveness for laboratory and small-batch trial production.

Main Technical Parameters

Full series coverage – choose the maskless lithography system that suits your needs.

Application Cases

Excellent Lithography Technology Meets Your Various Requirements

▲ 2D material lithography electrode (left), photodetector (right)

▲ 20mm×20mm semiconductor device, four-layer overlay alignment, minimum line width 6μm

▲ Microfluidic chip (left), microfluidic master mold (right)

▲ Overlay alignment function achieved with DMD UV lithography

▲ Electrode overlay alignment on etched tellurium nano-grid

▲ Grayscale lithography Fresnel lens [3D grayscale lithography achieving a Fresnel lens, with continuous step variation visible in the cross-sectional SEM image]

▲ Combined DMD UV and electron beam lithography [Models used: ZML10A and ZEL304G]

Engineered for high-mix manufacturing environments, the DMD maskless lithography machine redefines productivity by merging digital agility with industrial-grade robustness. This system employs a state-of-the-art DMD array with over 2 million individually addressable mirrors, achieving write speeds exceeding 100 mm²/min at 1μm resolution. Each DMD maskless lithography machine is factory-calibrated to deliver ±0.1μm pattern placement accuracy, supported by a vibration-isolation stage and active temperature stabilization. Crucially, the DMD maskless lithography machine incorporates intelligent dose mapping, which compensates for substrate reflectivity and resist thickness variations automatically—ensuring consistent linewidths across the entire exposure field. For foundries handling frequent product changes, this DMD maskless lithography machine slashes setup time from hours to minutes, as no physical masks need to be sourced or inspected.

The operational intelligence of this DMD maskless lithography machine extends to its proprietary exposure optimization algorithm, which simulates aerial images before patterning to predict and correct proximity effects. This feature is particularly valuable for sub-2μm features, where our DMD maskless lithography machine consistently outperforms competing digital lithography tools. Moreover, the system supports dynamic focus mapping for warped or uneven substrates, a common challenge in wafer-level packaging. With an optional high-power UV-LED module, this DMD maskless lithography machine achieves throughput comparable to mask-based aligners, yet retains the full flexibility of maskless operation. Data management is streamlined via encrypted network connectivity, allowing remote job queuing and real-time monitoring—ideal for Industry 4.0 integration.

To summarize, the DMD maskless lithography machine delivers a compelling total cost of ownership by eliminating mask costs, reducing material waste, and enabling rapid prototyping-to-production transitions. Its rugged construction ensures >95% uptime, while the adaptive optics extend component lifespan beyond 20,000 operating hours. Every DMD maskless lithography machine undergoes rigorous factory acceptance testing, with optional on-site installation and training packages. Whether you are developing novel photonic devices or scaling up sensor production, this DMD maskless lithography machine provides the precision, speed, and intelligence required to stay competitive. Contact our application team today to learn how this DMD maskless lithography machine can be tailored to your specific layer requirements—from i-line to broadband UV spectra.