In the field of semiconductor manufacturing, maskless lithography technology has gradually become an important direction in the field of micro-nano processing due to its flexibility and cost-effectiveness. Domestic equipment manufacturer Zewei Technology has shown significant advantages in performance parameters, application scenarios, and localized services with its independently developed DMD and nano-piezoelectric displacement stage technology, but compared with imported equipment, there is still a certain gap in brand awareness and technology accumulation. This article objectively analyzes the competitiveness of domestic maskless lithography machines based on the actual application cases and technical parameters of Zewei Technology.

I. Core Advantages of Domestic Maskless Lithography Machines

1.  High Precision and High Flexibility

Nano-Piezoelectric Displacement Stage Splicing Technology : Zewei Technology's maskless lithography machine uses nano-scale piezoelectric drive technology to achieve sub-micron positioning accuracy) and supports large-area splicing lithography. Its splicing accuracy is controlled within ±0.3μm, meeting the manufacturing needs of complex structures such as MEMS sensors and two-dimensional material devices.
Red Light Guidance and Real-Time Preview : Through the red light guided exposure system and CCD camera field-by-field automatic focusing, the operator can directly observe the exposure area, which significantly improves the processing intuitiveness and accuracy, especially suitable for laboratory rapid iteration research and development scenarios.

2.  Diversified Process Adaptability

OPC Correction Algorithm and Grayscale Light Uniformization Technology : The built-in Optical Proximity Correction (OPC) algorithm optimizes the graphic quality, and the combination of grayscale light uniformization technology achieves uniform exposure, which can handle complex lithography patterns and reduce defect rates. For example, Zewei equipment has been successfully applied to the preparation of PdSe₂ thin film pressure sensors and SOI/PbSe heterojunction photodetectors.
Multi-Wavelength Light Source Support : Supports ultraviolet (405nm), green light and other multi-wavelength exposure, compatible with yellow/green light guidance, suitable for micro-nano processing needs of different materials, such as two-dimensional material transfer, metal electrode writing, etc.

3.  Localized Service and Cost Advantage

Rapid Response and Customized Development : Zewei Technology provides complete solutions from equipment customization to process optimization. For example, the DMD lithography system customized for the University of Electronic Science and Technology team has successfully achieved the efficient preparation of biomimetic retina dual-mode photodetectors and PtTe₂/WS₂ heterojunctions.
Cost Performance and After-Sales Guarantee : Compared with the high prices and maintenance costs of imported equipment, Zewei Technology's products have won the favor of universities and small and medium-sized enterprises with lower purchase costs and localized services.

II. Existing Challenges of Domestic Maskless Lithography Machines

1.  High-End Technology Accumulation and Brand Recognition

Imported equipment (such as ASML, Nikon) still dominates the high-end lithography machine field of semiconductor mass production lines, and its technology has been accumulated for decades. Domestic equipment is still in the catching-up stage in cutting-edge fields such as EUV and high NA lithography.
Zewei equipment is mainly used in scientific research and special process scenarios (such as MEMS, two-dimensional material devices), and has not yet entered the mainstream IC manufacturing production line on a large scale.

2.  Process Stability and Consistency

Although Zewei equipment performs well in the laboratory (such as SOI/PbSe detectors achieving a 170dB dynamic range), in the mass production of domestic equipment, the long-term operating stability and overlay accuracy of the equipment still need to be further verified.

3.  Ecosystem Construction and Industrial Chain Collaboration

Domestic lithography machines need to form closer industrial chain collaboration with EDA software, material suppliers, etc. For example, domestic equipment needs to be used with magnetron sputtering, reactive ion etching and other equipment, while imported manufacturers can often provide more complete solutions.

III. Zewei Technology's Market Positioning and Development Opportunities

Zewei Technology takes "precision measurement empowers technological innovation" as its core concept, aiming at universities, research institutes and segmented field enterprise customers, and provides differentiated solutions. Its advantageous fields include:

MEMS sensors : such as PdSe₂ differential pressure sensors, biomimetic retina photodetectors;
Two-dimensional material devices : PtTe₂/WS₂ heterojunction, graphene/Si heterojunction;
Customized Micro-Nano Processing : Support users to realize in-situ drawing through software such as Klayout to meet personalized research and development needs.

In the future, with the advancement of domestic substitution policies and the improvement of the demand for independent control of the semiconductor industry chain, Zewei Technology can gradually narrow the gap with international giants by continuously optimizing algorithms and expanding application scenarios.

Domestic maskless lithography machines already have strong competitiveness in flexibility, customized services and cost performance, especially in the field of scientific research and emerging technology tracks (such as two-dimensional materials, MEMS). Zewei Technology provides a model for the breakthrough of domestic equipment through technological innovation and localized services. Although there is still room for improvement in high-end technology and ecological construction, with the increase in R&D investment and the deepening of industrial chain collaboration, domestic lithography machines are expected to occupy a more important position in the global market.