DMD Maskless Lithography

ZML Series Maskless Lithography System

Diverse Models  
High Efficiency, Flexibility, High Resolution, and High Overlay Accuracy

Critical Dimension 0.5μm | High-Precision Stepper Lithography

ZEPTOOLS ZML Series DMD Maskless Lithography System adopts advanced digital micromirror direct-write technology, enabling precise exposure of arbitrary micro/nano patterns without the need for traditional masks, with excellent processing accuracy and stable imaging. The system features a compact design, combined with intelligent autofocus and an intuitive operating system, making it easy to learn and efficient to use. It can significantly shorten R&D cycles and reduce mask-making costs. It is widely suitable for microfluidics, MEMS, functional thin films, 2D material devices, and other scenarios, making it an ideal micro/nano fabrication system for laboratories and small-batch trial production that balances high precision, high flexibility, and high cost-effectiveness.

Main Technical Specifications

Full series coverage — choose the maskless lithography system you prefer

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Application Cases

Exceptional lithography technology to meet your various requirements

2D Material Lithography Electrodes (left), Photodetectors (right)

20mm×20mm Semiconductor Device, Four-Layer Overlay, Minimum Linewidth 6μm

Microfluidic Chip (left), Microfluidic Master Mold (right)

DMD UV Lithography Achieves Overlay Function

Overlay Electrodes After Tellurium Nanomesh Etching

Grayscale Lithography Fresnel Lens [3D grayscale lithography to realize Fresnel lens; the SEM cross-sectional image shows continuous step variation]

Combined DMD UV and Electron Beam Lithography [Models used: ZML10A and ZEL304G]

More Cases

ZEPTOOLS DMD Maskless Lithography Systems Help Research Teams Publish High-Level Journal Results

Maskless Lithography for Localized Tube FormationIn a key micro/nano fabrication step, ZEPTOOLS ZML Series DMD Maskless Lithography System performs millimeter-scale patterned localization on STO/SRO/SCO epitaxial heterojunction thin films, replacing traditional masks to rapidly define rectangular/disk-shaped units, which are then formed by ion beam etching; after sacrificial layer acid etching, the thin film self-rolls into microtubes, providing a patterning basis for preparing high-crystalline-quality SrRuO₃ radial magnetic configuration microtubes.

Maskless Lithography for Sensor PatterningIn the fabrication of PdSe₂ differential pressure sensors, ZEPTOOLS DMD Maskless Lithography System handles micro/nano patterning localization. Using a DMD digital mask instead of a physical mask, and with nanopiezoelectric stage stitching, red-light guidance, OPC correction, and CCD autofocus, it precisely defines Wheatstone bridge and electrode patterns on SiNₓ/PdSe₂ thin films, providing a reliable lithography basis for transfer-free 2D material MEMS devices.

Maskless Lithography for Photodetection PatterningIn the fabrication of PtTe₂/WS₂/pyramid-Si heterojunction photodetectors, ZEPTOOLS DMD Maskless Lithography System handles micro/nano patterning. Using a DMD digital mask instead of a physical mask, and with nanopiezoelectric stitching, red-light guidance, OPC correction, and CCD autofocus, it precisely defines Pt electrodes and PtTe₂ patterns on pyramid-Si/WS₂, providing a reliable lithography basis for semi-conformal vdW heterojunction devices.

Maskless Lithography for Retina-Inspired PatterningIn the fabrication of SOI/graphene retina-inspired dual-mode photodetectors, ZEPTOOLS DMD Maskless Lithography System handles micro/nano patterning. Using a DMD digital mask instead of a physical mask, and with yellow/green-light guidance, CCD field-by-field autofocus, and linear motor stage, it precisely defines graphene electrodes and heterojunction patterns on SOI substrates, providing a reliable lithography basis for 170 dB wide-dynamic-range dual-mode devices.

Maskless Lithography for Broadband Detection PatterningIn the fabrication of SOI/PbSe visible-to-shortwave-infrared dual-mode photodetectors, ZEPTOOLS DMD Maskless Lithography System handles micro/nano patterning. Using a DMD digital mask instead of a physical mask, and with yellow/green-light guidance, CCD field-by-field autofocus, and linear motor stage, it precisely defines PbSe thin films and electrode patterns on SOI substrates, providing a reliable lithography basis for bias-tunable dual-mode broadband detection devices

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