Product classification
Electron Beam Lithography (EBL) System
Electron Beam Lithography (EBL) System
Classification:
Product Description
Electron Beam Direct-Write Lithography
ZEL304G Electron Beam Lithography System
The High-Precision Choice for Micro/Nano Structure Fabrication
Precisely Controllable | Efficient and Stable
ZEPTOOLS ZEL304G Electron Beam Lithography System is equipped with a high-performance field emission electron gun and a high-speed pattern generation system, enabling high-precision, high-resolution micro/nano structure lithography. The system features a high-precision laser interferometer stage, supporting large-travel precise stitching and overlay, and is compatible with multiple pattern formats and multi-layer automatic exposure, meeting complex micro/nano fabrication requirements. It is widely used in frontier physics, semiconductors, microelectronics, photonics, quantum research, and new materials development, providing a stable and reliable domestically developed solution for scientific research innovation and high-end micro/nano fabrication.

Main Technical Specifications
Fully adaptable to micro/nano fabrication needs — choose the high-performance electron beam lithography system you need
Product Model
ZEL304G
Electron Gun
Schottky field emission electron gun
Minimum Single-Exposure Linewidth
Ultra-High-Resolution Nanoscale Pattern Fabrication
Scanning Mode
Sequential scanning (Z-type), cyclic scanning (S-type), spiral scanning, and other vector scanning modes
Exposure Mode
Supports field calibration, field stitching, overlay, and multi-layer automatic exposure
External Channel Support
Supports electron beam scanning, stage movement, beam blanking, and secondary electron detection
Application Cases
Exceptional lithography technology to meet your various requirements

Uniformity Test

Field Stitching (measured with vernier caliper) and Minimum Linewidth Test

HSQ Resist

PMMA Resist

Thick Resist Test

Seamless Stitching of Long Gratings


Electron Beam Proximity Effect Correction Function · Dose Correction Effect

Combined DMD UV and Electron Beam Lithography [Models used: ZML10A and ZEL304G]
Selected Customers
The trusted choice of numerous universities, research institutions, and enterprises

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Independently developed by ZEPTOOLS, providing a complete set of micro/nano analysis solutions
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