Electron Beam Lithography (EBL) System

Electron Beam Lithography (EBL) System

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Product Description

Electron Beam Direct-Write Lithography

ZEL304G Electron Beam Lithography System

The High-Precision Choice for Micro/Nano Structure Fabrication

Precisely Controllable | Efficient and Stable

ZEPTOOLS ZEL304G Electron Beam Lithography System is equipped with a high-performance field emission electron gun and a high-speed pattern generation system, enabling high-precision, high-resolution micro/nano structure lithography. The system features a high-precision laser interferometer stage, supporting large-travel precise stitching and overlay, and is compatible with multiple pattern formats and multi-layer automatic exposure, meeting complex micro/nano fabrication requirements. It is widely used in frontier physics, semiconductors, microelectronics, photonics, quantum research, and new materials development, providing a stable and reliable domestically developed solution for scientific research innovation and high-end micro/nano fabrication.

ZEL304G Electron Beam Lithography System

Main Technical Specifications

Fully adaptable to micro/nano fabrication needs — choose the high-performance electron beam lithography system you need

Product Model 
ZEL304G

Electron Gun 
Schottky field emission electron gun

Minimum Single-Exposure Linewidth 
Ultra-High-Resolution Nanoscale Pattern Fabrication

Scanning Mode 
Sequential scanning (Z-type), cyclic scanning (S-type), spiral scanning, and other vector scanning modes

Exposure Mode 
Supports field calibration, field stitching, overlay, and multi-layer automatic exposure

External Channel Support 
Supports electron beam scanning, stage movement, beam blanking, and secondary electron detection

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Application Cases

Exceptional lithography technology to meet your various requirements

Uniformity Test

Uniformity Test

Field Stitching and Minimum Linewidth Test

Field Stitching (measured with vernier caliper) and Minimum Linewidth Test

HSQ Resist

HSQ Resist

PMMA Resist

PMMA Resist

Thick Resist Test

Thick Resist Test

Seamless Stitching of Long Gratings

Seamless Stitching of Long Gratings

Lithography Test
Electron Beam Proximity Effect Correction

Electron Beam Proximity Effect Correction Function · Dose Correction Effect

Combined DMD UV and Electron Beam Lithography

Combined DMD UV and Electron Beam Lithography [Models used: ZML10A and ZEL304G]

Selected Customers

The trusted choice of numerous universities, research institutions, and enterprises

Selected Customers

Start Your Micro/Nano Lithography Journey

Independently developed by ZEPTOOLS, providing a complete set of micro/nano analysis solutions

Phone Consultation +86-400-966-2800

Email Consultation micage@zeptools.com

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