Electron Beam Direct-Write Lithography

ZEL Mini Electron Beam Lithography System

A lightweight choice for desktop-level micro/nanofabrication

High-precision direct writing | Rapid small-batch prototyping

The ZEPTOOLS ZEL Mini Electron Beam Lithography System is equipped with a LaB₆ electron gun and an integrated pattern generation module, enabling high-precision direct-write lithography of micro/nano samples. The system integrates a piezoelectric nanopositioning stage and automated exposure software, supporting small-batch and rapid prototyping, with layout import, proximity effect correction, field stitching, and overlay completed in one workflow. It is suitable for frontier research such as teaching experiments, new materials, micro/nano photonics, and quantum devices, providing a lightweight domestically developed in-house solution for micro/nanofabrication prototypes.

Key Technical Specifications

Lightweight body, fully retaining the core capabilities of electron beam lithography

Product model 
ZEL Mini

Electron gun 
LaB₆ electron gun

Patterning and correction 
Supports GDSII / DXF / BMP layout formats, with integrated 2D / 3D proximity effect correction and grayscale exposure

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Application Cases

From metasurfaces to quantum devices, direct writing of micro/nanostructures in one step

Oscillator pattern array	Octagonal helical bullseye structure
2D material electrode patterns	Metasurface structure array
Micro/nanolens structures	Photonic crystal structures

Selected Customers

Trusted by numerous universities, research institutions, and enterprises

Start Your Micro/Nano Lithography Journey

Independently developed by ZEPTOOLS, providing a complete set of micro/nanofabrication solutions

Phone consultation 400-966-2800

Email consultation micage@zeptools.com